Chipq Micro has obtained a patent related to suction cup potential monitoring, which monitors the suction cup potential, eliminates charge accumulation, and prevents electrostatic damage.

March 21 News: According to information from the National Intellectual Property Administration, Hefei Xinqi Microelectronics Equipment Co., Ltd. has applied for a patent titled “Suction Cup Voltage Monitoring System for Maskless Direct Write Lithography Exposure Machines and the Direct Write Lithography Exposure Machine.” The patent has been granted with the publication number CN224020147U, with the grant announced on March 20, 2026. The application number is CN202520419485.1, published on March 20, 2026, with an application date of March 11, 2025. Inventors include Ge Xingyu, Zhu Huimin, Cao Guilin, Lu Xiaoqi, and Sun Wenbiao. The patent agency is Beijing Jingwen Intellectual Property Agency Co., Ltd., with patent agent Zhao Qiaocong. The classification code is G03F7/20.

Patent Abstract: The utility model discloses a suction cup voltage monitoring system and a direct write lithography exposure machine for maskless direct write lithography. The system includes a suction cup device, a voltage sensor, a switch component, an ion generator, and a controller. The controller controls the switch to send vacuum or break vacuum commands to regulate airflow in the air duct, thereby controlling the suction cup to enter vacuum or break vacuum states for adsorption or separation of the substrate. It also receives voltage differences from the sensor and, when the suction cup is in break vacuum and the voltage difference exceeds a preset calibration value, sends a discharge command to the ion generator to generate ions in the airflow, effectively eliminating static charge accumulation caused by friction between the suction cup and the substrate, preventing static electricity damage to electronic components on the machine.

Hefei Xinqi Microelectronics Equipment Co., Ltd. was established on June 30, 2015, and listed on the Shanghai Stock Exchange on April 1, 2021. Its registered and office addresses are both in Hefei, Anhui Province. It is a leading enterprise in China’s micro-nano direct write lithography equipment field, with core business in lithography equipment and services, possessing technological and full industry chain advantages.

The company belongs to the Shenwan industry category of Machinery Equipment - Special Equipment - Other Special Equipment, involving concepts such as PCB, annual report pre-increase, OLED, etc. Its main business is R&D, production, sales, and maintenance of direct imaging equipment and direct write lithography equipment centered on micro-nano direct write lithography, covering multiple lithography segments.

In 2025, Xinqi Microelectronics achieved revenue of 1.408 billion yuan, ranking first in the industry, aligned with the industry average and median. Main business revenue breakdown: PCB series 1.08 billion yuan (76.69%), general semiconductor series 233 million yuan (16.58%), leasing and others 87.39 million yuan (6.21%), additional (supplementary) 7.38 million yuan (0.52%). Net profit was 290 million yuan, also ranking first in the industry, consistent with the industry average and median.

Recent patent applications by Hefei Xinqi Microelectronics Equipment Co., Ltd.:

No. Patent Name Type Legal Status Application No. Application Date Publication Number Publication Date Inventors
1 Foldable Clamping Mechanism and LDI Equipment Utility Model Granted CN202520797048.3 2025-04-24 CN224005412U 2026-03-17 Wang Zhiquan, Liang Xu
2 Optical Distance Measurement Device and Laser Direct Write Exposure Machine Invention Patent Effective after substantive examination, published CN202510416740.1 2025-04-03 CN120293010A 2025-07-11 Xu Jianfeng, Mu Lu, Jiang Weiran
3 Laser Processing Device and System Invention Patent Effective after substantive examination, published CN202510309673.3 2025-03-17 CN120095316A 2025-06-06 Liu Menghui, Zhao Shangzhou
4 Suction Cup Voltage Monitoring System for Maskless Direct Write Lithography Exposure Machine Utility Model Granted CN202520419485.1 2025-03-11 CN224020147U 2026-03-20 Ge Xingyu, Zhu Huimin, Cao Guilin, Lu Xiaoqi, Sun Wenbiao
5 Adsorption Component and Exposure Device with It Invention Patent Effective after substantive examination, published CN202510276930.8 2025-03-10 CN119987158A 2025-05-13 Ye Fei, Cheng Gang, Xiang Zongqi, Wang Tao
6 Adsorption Component and Exposure Device with It Utility Model Granted CN202520372061.4 2025-03-05 CN223692643U 2025-12-19 Yu Chengxin
7 Alignment Method for LDI Exposure Machine and LDI Exposure Machine Invention Patent Effective after substantive examination, published CN202510224817.5 2025-02-27 CN119805888A 2025-04-11 Zhao Xiangbao, Zheng Chao, Zhu YuanZhe
8 Alignment Method for LDI Exposure Machine and LDI Exposure Machine Invention Patent Granted CN202510225750.7 2025-02-27 CN119805889B 2025-11-28 Zhao Xiangbao, Cai Zhihong
9 Offset Correction and Alignment Method and Device for Direct Write Lithography, Medium, and Lithography Machine Invention Patent Effective after substantive examination, published CN202510148769.6 2025-02-11 CN119805879A 2025-04-11 Wang Ke, Cheng Jiangao
10 Vibration Dividing Plate Device Utility Model Granted CN202520211748.X 2025-02-11 CN223792483U 2026-01-13 Lu Yuan, Shu Yi, Liu Hanyun
11 Double-Table Exposure Machine Utility Model Granted CN202520171673.7 2025-01-25 CN223796823U 2026-01-13 Yu Chengxin
12 Exposure Dose Correction System Utility Model Granted CN202520171669.0 2025-01-25 CN223796822U 2026-01-13 Li Zhihao, Dong Banglin, Mu Lu, Song Zhaoyi
13 Automatic Insert Frame Storage Device Invention Patent Granted CN202510120189.6 2025-01-25 CN119822052B 2026-03-13 Jiao Guanhua, Lu Yuan, Shu Yi, Liu Hanyun
14 Insert Plate Clamping Device Invention Patent Granted CN202510120188.1 2025-01-25 CN119822051B 2026-03-17 Lu Yuan, Jiao Guanhua, Shu Yi, Liu Hanyun
15 Moving Exposure Workbench, Exposure System, and Control Method Invention Patent Effective after substantive examination, published CN202510110128.1 2025-01-23 CN119644681A 2025-03-18 Li Hui
16 Moving Exposure Workbench and Exposure System with It Utility Model Granted CN202520160598.4 2025-01-23 CN223911162U 2026-02-13 Li Hui
17 Laser Drilling Equipment for UV Laser Puncture Process Invention Patent Effective after substantive examination, published CN202510057567.0 2025-01-14 CN119794623A 2025-04-11 Liu Menghui, Zhao Shangzhou
18 Laser Parallel Processing Equipment Based on Deflection Mirror for Beam Splitting and Control Utility Model Granted CN202520083435.0 2025-01-14 CN223932816U 2026-02-24 Liu Menghui
19 Independent Dynamic Control of Laser Drilling with Cascaded AOM Devices Utility Model Granted CN202520083520.7 2025-01-14 CN223932871U 2026-02-24 Liu Menghui
20 Heat Dissipation Device for Laser Diodes, High-Power Semiconductor Laser, and Assembly Method Invention Patent Effective after substantive examination, published CN202510016572.7 2025-01-06 CN119994629A 2025-05-13 Liu Liang, Yang Kai
21 Debugging Fixture and Method for Semiconductor Space Laser Diode Lenses Invention Patent Effective after substantive examination, published CN202510016571.2 2025-01-06 CN120002560A 2025-05-16 Liu Liang, Yang Kai
22 Laser Casing and Semiconductor Space Laser Utility Model Granted CN202520025368.7 2025-01-06 CN223797724U 2026-01-13 Liu Liang, Jin Weilong, Yang Kai
23 Exposure Device Utility Model Granted CN202423309294.4 2024-12-31 CN223566032U 2025-11-18 Ye Fei
24 Heat Dissipation Mechanism for Light Head Base Plate and Exposure Machine Utility Model Granted CN202423314307.7 2024-12-31 CN223712003U 2025-12-23 Zhang Wenlong, Liang Xu
25 Direct Write Lithography Exposure Control Method and Device, Medium, and Lithography Machine Invention Patent Effective after substantive examination, published CN202411904595.3 2024-12-23 CN119556532A 2025-03-04 Wang Chao, Mei Wenhui, Zhao Meiyun, Shao Deyang
26 Automatic Loading and Unloading Device Utility Model Granted CN202423178878.2 2024-12-23 CN223572237U 2025-11-21 Zhang Liang, Zhao Shangzhou, Li Hui, Yue Lan
27 Adsorption Assembly and Lithography Device with It Invention Patent Effective after substantive examination, published CN202411726109.3 2024-11-28 CN119511647A 2025-02-25 Hou Qingwei, Wang Tao
28 Device, Method, and Lithography Machine to Improve Exposure Power Density of Maskless Lithography Invention Patent Granted, effective after substantive examination, published CN202411720670.0 2024-11-28 CN119292005B 2025-10-10 Bian Hongfei, Zhang Hui, Ye Jialiang, Chen Dong
29 Space Light Modulation-Based Dual-Band Laser Micro-Nano Manufacturing Device and Method Invention Patent Effective after substantive examination, published CN202411700772.6 2024-11-26 CN119387805A 2025-02-07 Zhang Hui, Bian Hongfei, Ye Jialiang, Chen Dong
30 Clamping Device Utility Model Granted CN202422891408.4 2024-11-26 CN223385416U 2025-09-26 Li Dongqing, Li Xiangbin, Jiao Guanhua, Xu Xin
31 Vacuum Adsorption Fixed Wafer Holder Utility Model Granted CN202422718008.3 2024-11-06 CN223598699U 2025-11-25 Yu Chengxin
32 Clamping Assembly and Lithography Device with It Utility Model Granted CN202422674996.6 2024-11-04 CN223666547U 2025-12-12 Wang Lixian, Liang Xu, Zhang Wenlong
33 Fan Filter Device Capable of Rapid Filter Replacement Utility Model Granted CN202422675578.9 2024-11-01 CN223425389U 2025-10-10 Cheng Qiang
34 Exposure Assembly and Lithography Equipment with It Invention Patent Effective after substantive examination, published CN202411543995.6 2024-10-31 CN119126500A 2024-12-13 Zhang Haowei, Liu Menghui, Wu Lin
35 Pneumatic Shading Device for LDI Equipment Utility Model Granted CN202422670377.X 2024-10-31 CN223401139U 2025-09-30 Zhang Wenlong
36 Water Cooling System for DMD Chip Heat Dissipation Utility Model Granted CN202422670371.2 2024-10-31 CN223598092U 2025-11-25 Zhang Wenlong, Liang Xu, Wang Lixian
37 Single-Table LDI Exposure Machine Design Patent Granted CN202430676628.8 2024-10-25 CN309380230S 2025-07-11 Wang Lixian, Xiang Zongqi, Liang Xu
38 FPD Edge Exposure Coding Equipment Design Patent Granted CN202430676627.3 2024-10-25 CN309385911S 2025-07-15 Cheng Qiang
39 High-Efficiency Single-Device Double-Side Exposure Equipment Invention Patent Effective after substantive examination, published CN202411492573.0 2024-10-24 CN119200348A 2024-12-27 Qu Lujie, Cheng Gang
40 High-Efficiency Single-Device Double-Side Exposure Equipment Utility Model Granted CN202422576617.X 2024-10-24 CN223217782U 2025-08-12 Qu Lujie, Cheng Gang
41 Focusing Assembly and Lithography Device with It Invention Patent Effective after substantive examination, published CN202411486173.9 2024-10-23 CN119126499A 2024-12-13 Xu Jianfeng, Dai Xiaolin, Huang Sihang
42 Calibration Assembly and Exposure Device with It Utility Model Granted CN202421971890.6 2024-08-13 CN223260027U 2025-08-22 Ye Fei
43 Laser Processing Equipment Design Patent Granted CN202430502595.5 2024-08-08 CN309288976S 2025-05-13 Zhang Liang
44 Dimming Method and Device for Lithography Target Image, Dimming Model, and Lithography Machine Invention Patent Published CN202411056926.2 2024-08-02 CN118840287A 2024-10-25 Feng Haochuan, Zheng Chao, Wang Chenyang
45 Direct Write Lithography Equipment and Exposure Control Method Invention Patent Granted, published CN202411056139.8 2024-08-02 CN118884780B 2025-09-16 Zhang Min, Dai Xiaolin, Wu Shaodong
46 Laser Processing Equipment with Visual Camera Device Utility Model Granted CN202421856554.7 2024-08-01 CN223418627U 2025-10-10 Zhang Liang, Dong Shuai
47 Optical Expansion Module and Optical System with It Invention Patent Granted, published CN202410988612.X 2024-07-23 CN118688972B 2025-09-26 Qu Lujie, Cai Yinyin, Cheng Gang, Zhao Meiyun
48 Optical Expansion Module and Optical System with It Invention Patent Granted, published CN202410988613.4 2024-07-23 CN118707743B 2025-11-07 Zhao Meiyun, Qu Lujie, Cai Yinyin, Cheng Gang
49 Safety Protection System and Method for Direct Write Lithography Machine Invention Patent Effective after substantive examination, published CN202410699512.5 2024-05-31 CN118466111A 2024-08-09 Tong Yu, Zhu Huimin, Zhou Hu
50 Energy Closed-Loop Control Method for Exposure Surface of LDI Equipment Invention Patent Effective after substantive examination, published CN202410699502.1 2024-05-31 CN118466110A 2024-08-09 Xie Jiachun, Zhu Huimin, Li Zhiqiang, Guo Hongli, Zhan Yali

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